High-dielectric constant insulators and the AMLCD process: is amorphous BST a candidate?
- P. Andry
- D.A. Neumayer
- et al.
- 1999
- MRS Spring Meeting 1999
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6 results for Debra Neumayer
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Patternable low-κ material for "greener" semiconductor manufacturing
- Qinghuang Lin
- Shyng-Tsong Chen
- et al.
- 2010
- ICSICT 2010
Multi-level integration of patternable low-κ material into advanced Cu BEOL
- Qinghuang Lin
- Shyng-Tsong Chen
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Integration of photo-patternable low-κ material into advanced Cu back-end-of-the-line
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2010
- Japanese Journal of Applied Physics
Organic transistors with low operating voltage and high mobility
- C. Dimitrakopoulos
- S. Purushothaman
- et al.
- 1999
- DRC 1999