Oxygen migration in TiO2-based higher-k gate stacks
- Sangbum Kim
- Stephen L. Brown
- et al.
- 2010
- Journal of Applied Physics
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H plasma cleaning and a-Si passivation of GaAs for surface channel device applications
- C. Marchiori
- D.J. Webb
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- 2009
- Journal of Applied Physics
A benchmark study on the thermal conductivity of nanofluids
- Jacopo Buongiorno
- David C. Venerus
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- 2009
- Journal of Applied Physics
Dislocation-interaction-based model of strained-layer relaxation
- Klaus W. Schwarz
- Yuhai Tu
- 2009
- Journal of Applied Physics
Stress determination in nickel monosilicide films using x-ray diffraction
- Conal E. Murray
- Zhen Zhang
- et al.
- 2009
- Journal of Applied Physics
Metal-induced dopant (boron and phosphorus) activation process in amorphous germanium for monolithic three-dimensional integration
- Jin-Hong Park
- Munehiro Tada
- et al.
- 2009
- Journal of Applied Physics
In situ study of the formation of silicide phases in amorphous Ni-Si mixed layers
- C. Van Bockstael
- C. Detavernier
- et al.
- 2009
- Journal of Applied Physics
Effect of Zn doping on SnAg solder microstructure and electromigration stability
- Minhua Lu
- Da-Yuan Shih
- et al.
- 2009
- Journal of Applied Physics
Sensitivity of spin-torque diodes for frequency-tunable resonant microwave detection
- C. Wang
- Y.-T. Cui
- et al.
- 2009
- Journal of Applied Physics
Characterization of phase change memory materials using phase change bridge devices
- Daniel Krebs
- Simone Raoux
- et al.
- 2009
- Journal of Applied Physics