0.25-μm lithography development using positive mode top surface imaging photoresist
- Douglas C. La Tulipe
- John P. Simons
- et al.
- 1994
- Microlithography 1994
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14 results at Microlithography 1994
Materials evaluation of antireflective coatings for single-layer 193-nm lithography
- Roderick R. Kunz
- Robert D. Allen
- 1994
- Microlithography 1994
Use of scatterometric latent image detector in closed loop feedback control of linewldth
- John Sturtevant
- Steve Holmes
- et al.
- 1994
- Microlithography 1994
Optimization of ESCAP photoresist for x-ray lithography
- A.T.S. Pomerene
- K.E. Petrillo
- et al.
- 1994
- Microlithography 1994