Publications

22 results at Microlithography 1993

Comparison of scalar and vector diffraction modelling for deep-UV lithography
- - Bruce W. Smith
  - Donis G. Flagello
  - et al.
- 1993
- Microlithography 1993
Vector diffraction analysis of phase-mask imaging in photoresist films
- - Donis G. Flagello
  - Alan E. Rosenbluth
- 1993
- Microlithography 1993
Rim phase-shift mask combined with off-axis illumination: A path to 0.5Λ/NA geometries
- - T.A. Brunner
- 1993
- Microlithography 1993
TAR processing for CD control in I-line and 248 nm lithography
- - Christopher Lyons
  - Nicholas Eib
  - et al.
- 1993
- Microlithography 1993
170 nm gates fabricated by phase-shift mask and top anti-reflector process
- - T.A. Brunner
  - P.N. Sanda
  - et al.
- 1993
- Microlithography 1993
Developments in 2D AFM metrology
- - Diana Nyyssonen
- 1993
- Microlithography 1993
Process optimization of APEX-E
- - Karen Petrillo
- 1993
- Microlithography 1993
Post-exposure bake as a process-control parameter for chemically-amplffied photoresist
- - John L. Sturtevant
  - Steven J. Holmes
  - et al.
- 1993
- Microlithography 1993
Mixed e-beam/optical lithography process for the fabrication of sub-0.25-μm poly gates
- - Keith T. Kwietniak
  - Michael G. Rosenfield
  - et al.
- 1993
- Microlithography 1993
Photoresist process latitude optimization for synchrotron x-ray lithography
- - Andrew T. Pomerene
  - David E. Seeger
  - et al.
- 1993
- Microlithography 1993