Publications

45 results at Polymer Engineering & Science

Poly(4‐chlorostyrene), a new high contrast negative E‐beam resist
- - J. Liutkus
  - M. Hatzakis
  - et al.
- 2004
- Polymer Engineering & Science
Ultrafast deep UV lithography using excimer lasers
- - K. Jain
  - S. Rice
  - et al.
- 2004
- Polymer Engineering & Science
Poly(methyl α‐trifluoromethylacrylate) as a positive electron beam resist
- - C. Grant Willson
  - Hiroshi Ito
  - et al.
- 2004
- Polymer Engineering & Science
Super strong polymers in planar directions
- - Anagnostis E. Zachariades
  - James Economy
- 2004
- Polymer Engineering & Science
Parameters, affecting the sensitivity of poly(methyl methacrylate) as a positive lithographic resist
- - Edward Gipstein
  - Augustus C. Ouano
  - et al.
- 2004
- Polymer Engineering & Science
Dissolution dynamics of some polymers: Solvent‐polymer boundaries
- - A.C. Ouano
  - J.A. Carothers
- 2004
- Polymer Engineering & Science
The preparation of oriented morphologies of the thermotropic aromatic copolyester of poly(ethylene terephthalate) and 80 mole percent p‐acetoxybenzoic acid
- - Anagnostis E. Zachariades
  - John A. Logan
- 2004
- Polymer Engineering & Science
Design of a positive resist for projection lithography in the mid‐UV
- - Grant Willson
  - Robert Miller
  - et al.
- 2004
- Polymer Engineering & Science
Organosilicon polymers for lithographic applications
- - J.M. Shaw
  - M. Hatzakis
  - et al.
- 2004
- Polymer Engineering & Science
Recent advances in the photodecomposition mechanisms of diazo‐oxides
- - J. Pacansky
- 2004
- Polymer Engineering & Science