Fluoropolymer resists: Progress and properties
- Hiroshi Ito
- H.D. Truong
- et al.
- 2003
- J. Photopolym. Sci. Tech.
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68 results at J. Photopolym. Sci. Tech.
Use of interferometric lithography to characterize the spatial resolution of a photoresist film
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- J. Photopolym. Sci. Tech.
Recent advances in the development of chemically amplified resists for applications in electron beam lithography
- David R. Medeiros
- 2002
- J. Photopolym. Sci. Tech.
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2002
- J. Photopolym. Sci. Tech.
Novel classes of cyclic olefin polymers for 193 nm lithography
- P. Rao Varanasi
- R.D. Allen
- et al.
- 2001
- J. Photopolym. Sci. Tech.
Novel fluoropolymers for use in 157 nm lithography
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- J. Photopolym. Sci. Tech.
Progress in 193nm resists: Impact of the development process on anhydride-containing resist materials
- Robert D. Allen
- Carl E. Larson
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Lithographic techniques for the fabrication of oligonucleotide arrays
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Fundamental aspects of norbornene-maleic anhydride co- and terpolymers for 193 nm lithography: Polymerization chemistry and polymer properties
- Hiroshi Ito
- Dolores C. Miller
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Cyclic olefm resist polymers and polymerizations for improved etch resistance
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- J. Photopolym. Sci. Tech.