Electrical and EPR Studies of Electrolytically Grown TiO2 (Rutile)G.V. ChandrashekharR.S. Title2019JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorrA. RayA. Reisman2019JES
Anomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their EliminationA. ReismanM. Berkenblitet al.2019JES
An electron microscope investigation of the effect of phosphorous doping on the plasma etching of polycrystalline siliconE.A. IreneE. Tierneyet al.2019JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: I. The Pressure Range Below 10 mTorrA. RayA. Reisman2019JES