3D opto-electrical device stacking on CMOS
- L. Dellmann
- Ute Drechsler
- et al.
- 2010
- Microelectronic Engineering
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221 results at Microelectronic Engineering
In situ X-ray diffraction study of thin film Ir/Si solid state reactions
- W. Knaepen
- J. Demeulemeester
- et al.
- 2010
- Microelectronic Engineering
In situ study of the formation of silicide phases in amorphous Co-Si mixed layers
- C. Van Bockstael
- K. De Keyser
- et al.
- 2010
- Microelectronic Engineering
The evolution of optical and electrical properties of low-k dielectrics under bias stress
- J.M. Atkin
- E. Cartier
- et al.
- 2009
- Microelectronic Engineering
Interfacial layer optimization of high-k/metal gate stacks for low temperature processing
- Barry P. Linder
- Vijay Narayanan
- et al.
- 2009
- Microelectronic Engineering
Scaling the MOSFET gate dielectric: From high-k to higher-k? (Invited Paper)
- Martin M. Frank
- SangBum Kim
- et al.
- 2009
- Microelectronic Engineering
Quasi-damascene metal gate/high-k CMOS using oxygenation through gate electrodes
- Changhwan Choi
- Takashi Ando
- et al.
- 2009
- Microelectronic Engineering
Recovery study of negative bias temperature instability
- Miaomiao Wang
- Sufi Zafar
- et al.
- 2009
- Microelectronic Engineering
Atomic layer deposition of Ge2Sb2Te5 thin films
- Mikko Ritala
- Viljami Pore
- et al.
- 2009
- Microelectronic Engineering
Lanthanum germanate as dielectric for scaled Germanium metal-oxide-semiconductor devices
- C. Andersson
- C. Rossel
- et al.
- 2009
- Microelectronic Engineering