CoSi2 formation in the presence of Ti, Ta or W
- C. Detavernier
- C. Lavoie
- et al.
- 2004
- Thin Solid Films
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Evolution of microstructure in Ti-Ta bilayer thin films on polycrystalline-Si and Si(001)
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2004
- Thin Solid Films
Plasma-enhanced atomic layer deposition of tantalum thin films: The growth and film properties
- H. Kim
- S.M. Rossnagel
- 2003
- Thin Solid Films
Modeling 3D effects of substrate topography on step coverage and film morphology of thin metal films
- T. Smy
- S.K. Dew
- et al.
- 2002
- Thin Solid Films
Spectroscopic anisotropy micro-ellipsometry for determination of lateral dimensions of form birefringent structures
- H. Bloeß
- J.W. Schultze
- et al.
- 2002
- Thin Solid Films
In situ resistivity study of copper-cobalt films: Precipitation, dissolution and phase transformation
- S.-L. Zhang
- J.M.E. Harper
- et al.
- 2001
- Thin Solid Films
The use of in situ X-ray diffraction, optical scattering and resistance analysis techniques for evaluation of copper diffusion barriers in blanket films and damascene structures
- C. Cabral Jr.
- C. Lavoie
- et al.
- 2001
- Thin Solid Films
Self-limiting chemical vapor deposition of an ultra-thin silicon oxide film using tri-(tert-butoxy)silanol
- K.A. Miller
- C. John
- et al.
- 2001
- Thin Solid Films
Interfacial reaction pathways and kinetics during annealing of epitaxial Al/TiN(001) model diffusion barrier systems
- J.-S. Chun
- P. Desjardins
- et al.
- 2001
- Thin Solid Films
Electromigration in AlCu lines: Comparison of Dual Damascene and metal reactive ion etching
- R. Filippi
- M. Gribelyuk
- et al.
- 2001
- Thin Solid Films