A self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperature
- G.M. Cohen
- C. Cabral Jr.
- et al.
- 2002
- MRS Proceedings 2002
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Crystallographic texture and phase metrology during damascene copper processing
- K.J. Kozaczek
- P. DeHaven
- et al.
- 2002
- MRS Proceedings 2002
Low temperature metal organic chemical vapor deposition of aluminum oxide thin films for advanced CMOS gate dielectric applications
- Spyridon Skordas
- Filippos Papadatos
- et al.
- 2002
- MRS Proceedings 2002
Characteristics of low-k and ultralow-k PECVD deposited SiCOH films
- A. Grill
- V.V. Patel
- et al.
- 2002
- MRS Proceedings 2002
The effect of surface preparation on the structure and electrical transport in an organic semiconductor
- Laura L. Kosbar
- Christos D. Dimitrakopoulos
- et al.
- 2001
- MRS Proceedings 2001
Strain relaxation mechanisms in He+-implanted and annealed Si1-xGex layers on Si(001) substrates
- S. Christiansen
- P.M. Mooney
- et al.
- 2001
- MRS Proceedings 2001
A self-aligned silicide process for thin silicon-on-insulator MOSFETs and bulk MOSFETs with shallow junctions
- G.M. Cohen
- C. Cabral Jr.
- et al.
- 2001
- MRS Proceedings 2001
A patterned SOI by masked anneal for system-on-chip applications
- G.M. Cohen
- D.K. Sadana
- 2001
- MRS Proceedings 2001
Thermal stability of strained Si on relaxed Si1-xGex buffer layers
- P.M. Mooney
- S.J. Koester
- et al.
- 2001
- MRS Proceedings 2001
Modeling of dislocations in an epitaxial island structure
- X.-H. Liu
- F.M. Ross
- et al.
- 2001
- MRS Proceedings 2001