Publications

358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Study of buried interfaces by soft x-ray fluorescence spectroscopy excited by synchrotron radiation
- - D.L. Ederer
  - J.A. Carlisle
  - et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Using scanning tunneling microscopy to underst and diffraction oscillations: Fe growth on Cu(100)
- - Kevin E. Johnson
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Compositional and Electrical Properties of Si Metal-Oxide-Semiconductor Structure Prepared by Direct Photoenhanced Chemical Vapor Deposition using a Deuterium Lamp
- - E. Machler
  - E.J. Williams
  - et al.
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Mass spectrometric studies of remote helium plasma dissociation of silane
- - Joseph M. Jasinski
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma enhanced chemical vapor deposition of TiO₂ in microwave-radio frequency hybrid plasma reactor
- - Young H. Lee
  - Kevin K. Chan
  - et al.
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electrical transport properties of hot electrons at metal, insulator, and semiconductor interfaces
- - R. Ludeke
  - A. Bauer
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Adhesion durability of tantalum BPDA-PDA polyimide interfaces
- - D. Neuaroschl
  - B.K. Furman
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF₄ and CHF
- - Y. Zhana
  - D. Vender
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Tribochemistry at Lubricated Interfaces
- - Xiaohe Pan
  - C.S. Bhatia
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma
- - M. Surendra
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films