Publications

358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Deposition of diamondlike carbon using a planar radio frequency induction plasma
- - D.L. Pappas
  - J. Hod wood
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high density plasmas. VIII. Study of the ion flux composition at the substrate in electron cyclotron resonance etching processes using fluorocarbon gases
- - Gottlieb S. Oehrlein
  - Ying Zhang
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Hot electron scattering effects in metal-semiconductor structures and their role in interface transport
- - A. Bauer
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Role of ions in reactive ion etching
- - J.W. Coburn
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Modification of the PHI sample mount for multiple- or micropositioning for Zalar rotation
- - Paul Soo
  - David L. Neiman
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Influence of energy reflected from the target on thin film characteristics
- - Harold F. Winters
  - H. Coufal
  - et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Directionality of Sputtered Cu Atoms in A Hollow Cathode Enhanced Planar Magnetron
- - S.M. Rossnagel
  - J.J. Cuomo
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Kinetic model for the chemical vapor deposition of tungsten in the silane reduction process
- - Julian J. Hsieh
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effects of ion bombardment in plasma etching on the fluorinated silicon surface layer: Real-time and postplasma surface studies
- - Gottlieb S. Oehrlein
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effects of substrate bias frequency in an electron cyclotron resonance plasma reactor
- - W.M. Holber
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films