Patterning of N:Ge2Sb2Te5 films and the characterization of etch induced modification for non-volatile phase change memory applicationsE. JosephT.D. Happet al.2008VLSI-TSA 2008
Extending technology roadmap by selective device footprint scaling and parasitics engineeringJie DengLan Weiet al.2008VLSI-TSA 2008
Access transistor design and optimization for 65/45nm high performance SOI eDRAMG. WangP. Parrieset al.2008VLSI-TSA 2008
Optimized scaling of diode array design for 32NM node phase change memoryKailiang LuBipin Rajendranet al.2008VLSI-TSA 2008
Effect of end-of-range defects on device leakage in direct silicon bonded (DSB) technologyHaizhou YinM. Hamaguchiet al.2008VLSI-TSA 2008