VDD scaling for FinFET logic and memory circuits: The impact of process variations and SRAM stabilityC.-H. LinK. Daset al.2006VLSI-TSA 2006
Tunable Workfunction for Fully Silicied Gates (FUSI) and Proposed MechanismsY.-H. KimC. Cabral Jr.et al.2006VLSI-TSA 2006