Publications

3 results at Microlithography 2001

Scattered light: The increasing problem for 193 nm exposure tools and beyond
- - Kafai Lai
  - Chung-Hsi Wu
  - et al.
- 2001
- Microlithography 2001
Aids for driving lithography hard: Wafer level process control features
- - Emily Fisch
  - Reginald Bowley
  - et al.
- 2001
- Microlithography 2001
Investigation on the mechanism of the 193nm resist linewidth reduction during the SEM measurement
- - C.-H.J. Wu
  - Wu-Song Huang
  - et al.
- 2001
- Microlithography 2001