Control of sidewall roughness formation in through-silicon via etch at non-cryogenic temperatures
- John M. Papalia
- Devi Koty
- et al.
- 2022
- SPIE Advanced Lithography 2022
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7 results at SPIE Advanced Lithography 2022
Vertical Travelling Scatterometry for Metrology on Fully Integrated Devices
- D. Schmidt
- Manasa Medikonda
- et al.
- 2022
- SPIE Advanced Lithography 2022
Study of surface interactions for encapsulation of phase change memory materials
- L. Buzi
- D. Koty
- et al.
- 2022
- SPIE Advanced Lithography 2022
Predicting overlay mark performance based on process emulation and optical simulation
- Sagarika Mukesh
- Jack Wong
- et al.
- 2022
- SPIE Advanced Lithography 2022
Scatterometry based methodologies for characterization of MRAM technology
- Manasa Medikonda
- Daniel Schmidt
- et al.
- 2022
- SPIE Advanced Lithography 2022
Throughput vs. Yield: reviewing the metrology needs for stochastics-aware process window analysis (SA-PWA)
- Jennifer Church
- Luciana Meli
- 2022
- SPIE Advanced Lithography 2022
Etch and Patterning Development for 2nm Node Nanosheet Devices
- Eric Miller
- Indira Seshadri
- et al.
- 2022
- SPIE Advanced Lithography 2022