Hot-carrier degradation in undoped-body etsoi fets and soi finfetsMiaomiao WangPranita Kulkarniet al.2010IRPS 2010
PBTI relaxation dynamics after ac VS. DC stress in high-K/metal gate stacksK. ZhaoJ.H. Stathiset al.2010IRPS 2010
Photovoltaic (PV) cells characterization using advanced optical toolsFranco StellariSteven E. Steenet al.2010IRPS 2010
High-K gate stack breakdown statistics modeled by correlated interfacial layer and high-k breakdown pathG. RibesP. Moraet al.2010IRPS 2010
Impact of charge trapping on the voltage acceleration of TDDB in metal gate/high-k n-channel MOSFETsA. KerberA. Vayshenkeret al.2010IRPS 2010
Characterization of high-k/metal gate stack breakdown in the time scale of ESD eventsYang YangJames Di Sarroet al.2010IRPS 2010
PBTI response to interfacial layer thickness variation in Hf-based HKMG nFETsD.P. IoannouE. Cartieret al.2010IRPS 2010