Publications

2 results at SPIE Photomask Technology + EUV Lithography 2010

Two complementary methods to characterize long range proximity effects due to develop loading
- - Linda K. Sundberg
  - Greg M. Wallraff
  - et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Understanding the trade-offs of thinner binary mask absorbers
- - Jaione Tirapu-Azpiroz
  - Gregory McIntyre
  - et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010