Monolithically integrated silicon nitride platform
Yusheng Bian, Colleen Meagher, et al.
OFC 2021
A competitive 300-mm silicon photonics foundry technology has been developed by GLOBALFOUNDRIES for general availability, which takes advantage of advanced CMOS process technology and provides a manufacturing scale. A state-of-the-art process design kit offers a codesign environment with access to a comprehensive photonics device library along with a monolithically integrated SOI CMOS device library. Advances in automated wafer-level optical test enable statistical photonic device characterization for development, photonic modeling, and manufacturing controls. The key challenges and solutions in developing a manufacturable photonic technology with state-of-the-art performance are described, as well as a roadmap for next generation high-performance monolithic silicon photonics are outlined.
Yusheng Bian, Colleen Meagher, et al.
OFC 2021
Bo Peng, Tymon Barwicz, et al.
Optics Letters
N. Feilchenfeld, Karen Nummy, et al.
SPIE Advanced Lithography 2017
Won Suk Lee, Sujith Chandran, et al.
OFC 2024