J.A. Yarmoff, D.K. Shuh, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The interaction between B2H6 and SiO2 was investigated by soft x-ray photoemission. Thermally activated, autocatalytic dissociative chemisorption of B2H6 on SiO2 to form elemental films was discovered at temperatures exceeding 550°C. These surfaces are shown to be quite reactive towards SiH2Cl2. This process is thus a mechanism whereby the selectivity of chemical vapor deposition exhibited by SiH2Cl2 towards SiO2 can be rapidly degraded.
J.A. Yarmoff, D.K. Shuh, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
C.-C. Yang, D. Edelstein, et al.
IITC 2009
E. Gusev, V. Narayanan, et al.
IEDM 2004
J.A. Yarmoff, D.K. Shuh, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films