Charge trapping in aggressively scaled metal gate/high-κ stacks
- E. Gusev
- V. Narayanan
- et al.
- 2004
- IEDM 2004
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94 results for Fenton R. McFeely
Chloroethane physisorbed on hydrogenated Si(111): A test system for the evaluation of core level XPS assignment rules at Si/SiO2 interfaces
- F.R. McFeely
- K.Z. Zhang
- et al.
- 1996
- MRS Fall Meeting 1996
Low-temperature reflow anneals of Cu on Ru
- C.-C. Yang
- Fenton R. McFeely
- et al.
- 2011
- IEEE Electron Device Letters
Synthetic Control of Solid/Solid Interfaces: Analysis of Three New Silicon/Silicon Oxide Interfaces by Soft X-ray Photoemission
- Sunghee Lee
- Sanjeev Makan
- et al.
- 1994
- JACS
Si/SiO2 interface: New structures and well-defined model systems
- Mark M. Banaszak Holl
- F. Read McFeely
- 1993
- Physical Review Letters
Breakdown of the semiclassical description of hot-electron dynamics in SiO2
- E.A. Eklund
- F.R. McFeely
- et al.
- 1992
- Physical Review Letters
Direct determination of impact-ionization rates near threshold in semiconductors using soft-x-ray photoemission
- E.A. Eklund
- P.D. Kirchner
- et al.
- 1992
- Physical Review Letters
Soft-x-ray induced core-level photoemission as a probe of hot-electron dynamics in SiO2
- F.R. McFeely
- E. Cartier
- et al.
- 1990
- Physical Review Letters
Fluorine-silicon reactions and the etching of crystalline silicon
- Chris G. Van De Walle
- F.R. McFeely
- et al.
- 1988
- Physical Review Letters
Chemical selectivity in photon-stimulated desorption of fluorine from silicon
- J.A. Yarmoff
- A. Taleb-Ibrahimi
- et al.
- 1988
- Physical Review Letters