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Photomask and Next-Generation Lithography Mask Technology 2004
The problem considered is to assign a measure of circularity to a given compact set in the plane. The measure adopted is the size of the smallest annulus containing the given set. Two different notions of the size of an annulus, that of area and that of difference of radii are studied. © 1979 Springer-Verlag.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
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