Conference paper
True 3-D displays for avionics and mission crewstations
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
Capillary forces naturally present during normal drying of photoresist materials were eliminated by developing a supercritical drying process. Supercritical carbon dioxide, organic solvents and surfactants were used to prevent the collapse of high-aspect-ratio structures fabricated from aqueous-based photoresist. The replacement of the aqueous rinse by n-hexane mediated by a compatible surfactant was introduced.
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures
Hiroshi Ito, Reinhold Schwalm
JES
Frank Stem
C R C Critical Reviews in Solid State Sciences