X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2005
- Langmuir
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109 results for Marie Angelopoulos
Water immersion of model photoresists: Interfacial influences on water concentration and surface morphology
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2005
- Journal of Microlithography, Microfabrication and Microsystems
Performance data on new tunable attenuating PSM for 193nm and 157nm lithography
- Hans Becker
- Frank Schmidt
- et al.
- 2004
- Photomask and Next-Generation Lithography Mask Technology 2004
Conducting polymers as lithographic materials
- Marie Angelopoulos
- Jane M. Shaw
- et al.
- 2004
- Polymer Engineering & Science
Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresists
- Vivek M. Prabhu
- Michael X. Wang
- et al.
- 2004
- Microlithography 2004
Measurements of water distribution in thin lithographic films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Microlithography 2004
Rinse additives for defect suppression in 193 nm and 248 nm lithography
- Spyridon Skordas
- Ryan L. Burns
- et al.
- 2004
- Microlithography 2004
Rinse additives for line edge roughness control in 193 nm lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2004
- Microlithography 2004
Surface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
Formation of deprotected fuzzy blobs in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2004
- Journal of Polymer Science, Part B: Polymer Physics