A Novel Graded Antireflective Coating with Built-in Hardmask Properties Enabling 65nm and Below CMOS Device Patterning
- K. Babich
- N. Fukiage
- et al.
- 2003
- IEDM 2003
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109 results for Marie Angelopoulos
Solvent, LiCl, and temperature effects on the morphological structure and electronic properties of polyaniline
- Marie Angelopoulos
- Yun-Hsin Liao
- et al.
- 1995
- MRS Fall Meeting 1995
Water soluble polyanilines: Properties and applications
- Marie Angelopoulos
- Niranjan Patel
- et al.
- 1993
- MRS Fall Meeting 1993
Low stress, high resolution photosensitive polyimide based on a BPDA/ PDA/6FDAm copolymer
- Marie Angelopoulos
- J. Gelorme
- et al.
- 1993
- MRS Fall Meeting 1993
Performance data on new tunable attenuating PSM for 193nm and 157nm lithography
- Hans Becker
- Frank Schmidt
- et al.
- 2004
- Photomask and Next-Generation Lithography Mask Technology 2004
Measurements of water distribution in thin lithographic films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Microlithography 2004
Rinse additives for defect suppression in 193 nm and 248 nm lithography
- Spyridon Skordas
- Ryan L. Burns
- et al.
- 2004
- Microlithography 2004
Rinse additives for line edge roughness control in 193 nm lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2004
- Microlithography 2004
Surface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresists
- Vivek M. Prabhu
- Michael X. Wang
- et al.
- 2004
- Microlithography 2004