Karl F. Ludwig Jr., Byungwoo Park
Physical Review Letters
Paper
Axiotaxy of CoSi 2 thin films on Si(100) substrates and the effects of Ti alloying
Abstract
The occurrence of axiotaxy in CoSi 2 thin films on Si(100) substrates and the effects of Ti alloying were discussed. The influence of Ti alloying was investigated by using in situ x-ray diffraction measurements, as well as pole figure analysis. It was found that the nucleation of both the CoSi and CoSi 2 phases is delayed to higher temperatures for the 5 at.% Ti alloyed films. It was also found that the texture of the CoSi 2 phase is also influenced by the addition of Ti.
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