In situ analysis of the formation of thin TiSi2 (<50 nm) contacts in submicron CMOS structures during rapid thermal annealing
- L. Clevenger
- C. Cabral Jr.
- et al.
- 1995
- MRS Fall Meeting 1995
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23 results for K.F. Ludwig Jr.
In-situ x-ray diffraction and resistivity analysis of CoSi2 phase formation with and without a Ti interlayer at rapid thermal annealing rates
- C. Cabral Jr.
- L. Clevenger
- et al.
- 1994
- MRS Fall Meeting 1994
X-ray scattering study of early stage spinodal decomposition in Al0.62Zn0.38
- J. Mainville
- Y.S. Yang
- et al.
- 1997
- Physical Review Letters
Development of fluctuations into domains during ordering in Fe3Al
- Byungwoo Park
- G. Brian Stephenson
- et al.
- 1992
- Physical Review Letters
Comment on Calculation and simulation of chemical-diffusion coefficients: The inadequacy of the mean-field theory
- Karl F. Ludwig Jr.
- Byungwoo Park
- 1992
- Physical Review Letters
Observation of a precursor during the crystallization of amorphous nizr2
- M. Sutton
- Y.S. Yang
- et al.
- 1989
- Physical Review Letters
Nucleated and continuous ordering in Cu3Au
- K.F. Ludwig Jr.
- G.B. Stephenson
- et al.
- 1988
- Physical Review Letters
Influence of substrate temperature during sputter deposition on the subsequent formation of titanium disilicide
- A.S. Özean
- K.F. Ludwig Jr.
- et al.
- 2002
- MRS Proceedings 2002
In-situ studies of silicide formation in Ti-Ta bilayer thin films on poly-Si
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2002
- MRS Proceedings 2002
Evolution of microstructure in Ti-Ta bilayer thin films on polycrystalline-Si and Si(001)
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2004
- Thin Solid Films