Nicolas Breil, Christian Lavoie, et al.
Microelectronic Engineering
This article explores challenges to fabricating contacts to CMOS devices as the industry transitions from planar to non-planar device geometries. Traditional challenges such as contacted gate pitch scaling, parasitic capacitance & resistance as well as newer challenges due to an increase in process & integration complexity are reviewed and highlighted.
Nicolas Breil, Christian Lavoie, et al.
Microelectronic Engineering
Praneet Adusumilli, Conal E. Murray, et al.
ECS Meeting 2009
Nicolas Breil, A. Carr, et al.
VLSI Technology 2017
James Kelly, James H.-C. Chen, et al.
IITC/AMC 2016