Victor Valls, Panagiotis Promponas, et al.
IEEE Communications Magazine
The chemical amplification concept was invented in IBM Research an quickly brought into use in the production of dynamic random access memory devices in the company. It has remained as an important foundation for the design and advanced resist systems for use in short-wavelength (<300-nm) lithographic technologies. The history and development of this concept are discussed.
Victor Valls, Panagiotis Promponas, et al.
IEEE Communications Magazine
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Maurice Hanan, Peter K. Wolff, et al.
DAC 1976
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering