Polymer chemistry considerations in the design of robust 193 nm photoresists
- R.D. Allen
- Hiroshi Ito
- et al.
- 1999
- ACS Spring 1999
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127 results for Hiroshi Ito
Design, preparation, characterization, and lithographic imaging of high performance chemically amplified deep UV resist
- Hiroshi Ito
- G. Breyta
- et al.
- 1997
- ACS Spring 1997
Influence of residual solvent on the absorption of N-methylpyrrolidone by polymer films
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1991
- ACS Spring 1991
Acid-catalyzed dehydration for the design of chemical amplification resists
- Hiroshi Ito
- R. Sooriyakumaran
- et al.
- 1991
- ACS Spring 1991
Progress in unzipping polyaldehyde resist systems
- Hiroshi Ito
- 1991
- ACS Spring 1991
High-aspect-ratio cylindrical nanopore arrays and their use for templating titania nanoposts
- Oun-Ho Park
- Joy Y. Cheng
- et al.
- 2008
- Advanced Materials
Smart self-adjustment of surface micelles of an amphiphilic block copolymer to nanoscopic pattern boundaries
- Bokyung Yoon
- June Huh
- et al.
- 2007
- Advanced Materials
Hybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- Hiroshi Ito
- Linda K. Sundberg
- et al.
- 2009
- SPIE Advanced Lithography 2009
Self-segregating materials for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2008
- SPIE Advanced Lithography 2008
Rise of chemical amplification resists from laboratory curiosity to paradigm enabling Moore's law
- Hiroshi Ito
- 2008
- SPIE Advanced Lithography 2008