Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
A critical review of the oxygen-aluminum system is presented. The primary emphasis concerns the electronic properties of aluminum surfaces exposed to oxygen. The chemisorption and oxidation aspects are considered. Cluster and slab model calculations are discussed fully and the results are related to relevant experimental data. Some of the unresolved issues are listed. A comprehensive guide to the oxygen-aluminum literature is provided. © 1984.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids