Sang-Min Park, Charles T. Rettner, et al.
Macromolecules
The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-PTMSS, L0 = 22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-epitaxy, using hydrogen silsesquioxane (HSQ) based prepatterns, achieved density multiplications up to 6× and trench space subdivisions up to 7×, respectively. These results establish the compatibility of DSA techniques with a high etch contrast, Si-containing BCP that requires a top coat neutral layer to enable orientation.
Sang-Min Park, Charles T. Rettner, et al.
Macromolecules
Michael J. Maher, Christopher M. Bates, et al.
J. Photopolym. Sci. Tech.
Charles T. Rettner, Ernesto E. Marinero, et al.
Journal of Physical Chemistry
Donald S. Bethune, Charles T. Rettner, et al.
IQEC 1984