Charles T. Rettner, Simone Anders, et al.
IEEE Transactions on Magnetics
The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-PTMSS, L0 = 22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-epitaxy, using hydrogen silsesquioxane (HSQ) based prepatterns, achieved density multiplications up to 6× and trench space subdivisions up to 7×, respectively. These results establish the compatibility of DSA techniques with a high etch contrast, Si-containing BCP that requires a top coat neutral layer to enable orientation.
Charles T. Rettner, Simone Anders, et al.
IEEE Transactions on Magnetics
Donald S. Bethune, Charles T. Rettner
IEEE JQE
Yi-Chou Chen, Yuyu Lin, et al.
ICSICT 2008
Charles T. Rettner, Lisa A. DeLouise, et al.
JVSTA