Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces
- Ji Yeon Kim
- Philip Liu
- et al.
- 2020
- ACS AMI
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104 results for C. Grant Willson
A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System
- Hiroshi Ito
- L.A. Pederson
- et al.
- 2019
- JES
Approaches to the Design of Radiation-Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution
- Jean M.J. Fréchet
- Theodore G. Tessier
- et al.
- 2019
- JES
Measurement of Thin-Film Dissolution Kinetics using a Quartz Crystal Microbalance
- W.D. Hinsberg
- C.G. Willson
- et al.
- 2019
- JES
High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
- Hsinyu Tsai
- Hiroyuki Miyazoe
- et al.
- 2016
- SPIE Advanced Lithography 2016
Interfacial layers with photoswitching surface energy for block copolymer alignment and directed self-assembly
- Michael J. Maher
- Christopher M. Bates
- et al.
- 2015
- J. Photopolym. Sci. Tech.
Directed self-assembly of silicon-containing block copolymer thin films
- Michael J. Maher
- Charles T. Rettner
- et al.
- 2015
- ACS AMI
Poling and crosslinking processes in NLO polymers
- William K. Bell
- Brandon M. Rawlings
- et al.
- 2014
- J Polym Sci Part A
On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
- R. Bruce
- Florian Weilnboeck
- et al.
- 2011
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Visco‐elastic properties of thin films probed with a quartz crystal resonator
- D. Johannsmann
- F.W. Embs
- et al.
- 2011
- Makromolekulare Chemie. Macromolecular Symposia