Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Using thermal co-evaporation we have prepared epitaxial Cu 2ZnSnS4 (CZTS) films on Si(001) substrates. A substrate temperature as high as 370 C and proper substrate cleaning (HF-dip followed by thermal desorption of surface hydrogens) are found to be necessary for the epitaxial growth. Detailed transmission electron microscopy measurements and X-ray diffraction studies are used to reveal the orientation relation of the CZTS films with the underlying silicon substrate, and the formation of defects within the CZTS layer. © 2014 Elsevier B.V.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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SPIE Advanced Lithography 2010
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JES
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Advanced Materials