Satoshi Oida, Fenton R. McFeely, et al.
Physical Review B - CMMP
In this letter, we demonstrate a gate-all-around single-wall carbon nanotube field-effect transistor. This is the first successful experimental implementation of an off-chip gate and gate-dielectric assembly with subsequent deposition on a suitable substrate. The fabrication process and device measurements are discussed in the letter. We also argue in how far charges in the gate oxide are responsible for the observed nonideal device performance. © 2008 IEEE.
Satoshi Oida, Fenton R. McFeely, et al.
Physical Review B - CMMP
Zhihong Chen, Joerg Appenzeller, et al.
DRC 2005
Selman Hershfield, Zhihong Chen
Journal of Applied Physics
Shu-Jen Han, Yanning Sun, et al.
VLSI Technology 2010