A. Rastelli, M. Stoffel, et al.
Microelectronics Journal
The growth kinetics of a crystal facet at low temperature and low stress are analyzed. It is shown that a planar strained layer can, in principle, be grown to arbitrary thickness by growing sufficiently slowly.
A. Rastelli, M. Stoffel, et al.
Microelectronics Journal
F.M. Ross, J. Tersoff, et al.
Physical Review Letters
F. Legoues, J. Tersoff, et al.
Applied Physics Letters
J. Tersoff
Physical Review Letters