Plasma etching of nanometer-scale self-assembled features
Ying Zhang, Charles T. Black, et al.
ISTC 2008
We combine nanometer-scale polymer self assembly with advanced semiconductor microfabrication to produce metaloxide-semiconductor (MOS) capacitors with accumulation capacitance more than 400% higher than planar devices of the same lateral area. The self assembly technique achieves this degree of enhancement using only standard processing techniques, thereby obviating additional process complexity. These devices are suitable for use as on-chip power supply decoupling capacitors, particularly in high-performance silicon-on-insulator technology. © 2004 IEEE.
Ying Zhang, Charles T. Black, et al.
ISTC 2008
Dong Ha Kim, Xinqiao Jia, et al.
Advanced Materials
Niyaz Khusnatdinov, Gerard M. Schmid, et al.
Microelectronic Engineering
Ting Xu, James T. Goldbach, et al.
Macromolecules