Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Given a square, nonnegative, symmetric matrix A, the Rayleigh quotient of a nonnegative vector u under A is given by QA(u) = uTAu/uTu. We show that QA(√u° Au) is not less than QA(u), where √ denotes coordinatewise square roots and ° is the Hadamard product, but that QA(Au) may be smaller than QA(u). Further, we examine issues of convergence. © 1997 Published by Elsevier Science Inc.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Renu Tewari, Richard P. King, et al.
IS&T/SPIE Electronic Imaging 1996
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Frank R. Libsch, Takatoshi Tsujimura
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