Conference paper
90 nm SiCOH technology in 300 mm manufacturing
L. Clevenger, M. Yoon, et al.
ADMETA 2004
The reaction of atomic hydrogen with adsorbed Br is compared on Si(100) and Si(111) surfaces from 50°C to 300°C. On both surfaces, Br removal rate is first order in atomic hydrogen flux, first-order in Br coverage, and exhibits a near zero activation energy. On Si(111), this rate also depends on surface hydrogen coverage, indicating that different mechanisms occur on these surfaces. © 1993 American Institute of Physics.
L. Clevenger, M. Yoon, et al.
ADMETA 2004
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
C.M. Greenlief, S. Gates, et al.
Chemical Physics Letters
D.D. Koleske, S. Gates
Applied Physics Letters