H.L. Bay, H.F. Winters, et al.
Applied Physics A Solids and Surfaces
A modulated beam mass-spectrometer system, which has been developed to obtain information about the mechanisms of etching reactions, is described. Experimental results for the reaction of XeF//2 with W(111) and silicon are presented. Implications for etching mechanisms of the experimentally determined etch product distributions, reaction probabilities and ion bombardment effects are discussed.
H.L. Bay, H.F. Winters, et al.
Applied Physics A Solids and Surfaces
H.F. Winters, J.W. Coburn
Applied Physics Letters
J.W. Coburn, H.F. Winters
Journal of Applied Physics
T.J. Chuang, H.F. Winters, et al.
Applications of Surface Science