INTERACTION OF FLUORINE COMPOUNDS WITH TUNGSTEN AND SILICON.
- H.F. Winters
- 1985
- Tungsten and Other Refractory Metals for VLSI Applications 1985
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50 results for H.F. Winters
The activated, dissociative chemisorption of methane on tungsten
- Harold F. Winters
- 2008
- The Journal of Chemical Physics
Electron-beam effects in depth profiling measurements with Auger electron spectroscopy
- J. Ahn
- C.R. Perleberg
- et al.
- 2008
- Journal of Applied Physics
Influence of the altered layer on depth profiling measurements
- Harold F. Winters
- J.W. Coburn
- 2008
- Applied Physics Letters
The kinetic isotope effect in the dissociative chemisorption of methane
- Harold F. Winters
- 2008
- The Journal of Chemical Physics
Plasma etching a "pseudo-black-box" approach
- Harold F. Winters
- J.W. Coburn
- et al.
- 2008
- Journal of Applied Physics
Ion-surface interactions in plasma etching
- J.W. Coburn
- H.F. Winters
- et al.
- 2008
- Journal of Applied Physics
The role of chemisorption in plasma etching
- Harold F. Winters
- 2008
- Journal of Applied Physics
The etching of silicon with XeF2 vapor
- H.F. Winters
- J.W. Coburn
- 2008
- Applied Physics Letters
Ion- and electron-assisted gas-surface chemistry - An important effect in plasma etching
- J.W. Coburn
- Harold F. Winters
- 2008
- Journal of Applied Physics