Laser chemical vapor deposition of copper

F.A. Houle; C.R. Jones; T.H. Baum; C. Pico; C.A. Kovac

doi:10.1063/1.95685

Applied Physics Letters

Paper

01 Jan 1985

Laser chemical vapor deposition of copper

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Abstract

The first laser-induced deposition of copper has been demonstrated using a volatile copper coordination complex. The technique is characterized by reasonable rates and by the high quality of copper produced.

Paper

Continuous wave visible laser assisted decomposition of Cr(CO)₆ on a growing film: In situ observations

F.A. Houle, L.I. Yeh

Journal of Physical Chemistry

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Optical self-regulation during laser-induced oxidation of copper

L. Baufay, F.A. Houle, et al.

Journal of Applied Physics

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Kinetic model for positive tone resist dissolution and roughening

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Origin of contaminants in photochemically deposited chromium films

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Abstract

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