Introduction of role playing to a research ethics module for the undergraduate
- Dolores C. Miller
- Frances A. Houle
- et al.
- 2009
- MRS Fall Meeting 2009
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85 results for Frances A. Houle
Characterization of vinyl ether UV-cure nanoimprint resist
- Taiichi Furukawa
- Frances A. Houle
- et al.
- 2009
- SPIE Advanced Lithography 2009
Cr migration on 193nm binary photomasks
- John Bruley
- Geoffrey Burr
- et al.
- 2009
- SPIE Advanced Lithography 2009
Quantitative measurement of resist outgassing during exposure
- Nicolae Maxim
- Frances A. Houle
- et al.
- 2009
- SPIE Advanced Lithography 2009
Quantification of outgassing of C-, Si-, and S-containing products during exposure of photoresists
- F.A. Houle
- N. Maxim
- et al.
- 2009
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Evaluation of 32nm Advanced immersion lithography pellicles
- N. Zhou
- K. Racette
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions
- Frances A. Houle
- Ann Fornof
- et al.
- 2008
- SPIE Advanced Lithography 2008
Nanoimprint materials systems
- F.A. Houle
- D.C. Miller
- et al.
- 2008
- J. Photopolym. Sci. Tech.
Metal-containing release layers for use with UV-cure nanoimprint lithographic template materials
- F.A. Houle
- S. Raoux
- et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nanoimprint lithography
- Frances A. Houle
- Ann Fornof
- et al.
- 2007
- SPIE Advanced Lithography 2007