P. Alnot, D.J. Auerbach, et al.
Surface Science
Paper
Light scattering properties of x-ray lithography mask substrates
Abstract
Experimental results are presented on the light scattering properties of x-ray mask substrates relevant to x-ray lithography systems utilizing optical alignment between mask and wafer. The results are compared with a simple light scattering model simulating the contrast in a bright field mask/wafer alignment system. © 1991.
Related
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
J.A. Barker, D. Henderson, et al.
Molecular Physics
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting