U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures
Paper
Light scattering properties of x-ray lithography mask substrates
Abstract
Experimental results are presented on the light scattering properties of x-ray mask substrates relevant to x-ray lithography systems utilizing optical alignment between mask and wafer. The results are compared with a simple light scattering model simulating the contrast in a bright field mask/wafer alignment system. © 1991.