E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
Paper
Low stress development of poly(methylmethacrylate) for high aspect ratio structures
Abstract
Magnetic head requirements for high aspect ratio pole tips were met using single-layer PMMA exposed at 100 kV. Using cooled mixtures of IPA and water and ultrasonic agitation, 14:1 aspect ratios in resist were demonstrated.
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