Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Paper
Low stress development of poly(methylmethacrylate) for high aspect ratio structures
Abstract
Magnetic head requirements for high aspect ratio pole tips were met using single-layer PMMA exposed at 100 kV. Using cooled mixtures of IPA and water and ultrasonic agitation, 14 aspect ratios in resist were demonstrated.
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