Overview of top-surface-imaging resists
- Scott A. MacDonald
- 1991
- ACS Spring 1991
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58 results for Scott A. MacDonald
Influence of residual solvent on the absorption of N-methylpyrrolidone by polymer films
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1991
- ACS Spring 1991
Nanoscale processing for thin film recording heads
- J.A. Katine
- R.E. Fontana Jr.
- et al.
- 2003
- INTERMAG 2003
Nanoscale processing for thin film recording heads
- J.A. Katine
- R.E. Fontana
- et al.
- 2003
- INTERMAG 2003
Processing and modeling options for advanced thin film magnetoresistive head structures
- R.E. Fontana Jr.
- M.L. Williams
- et al.
- 1999
- INTERMAG 1999
Resist materials design: Base-catalyzed chemical amplification
- C.G. Wilison
- J.F. Cameron
- et al.
- 1993
- Microlithography 1993
Positive tone dry-develop resist based on cross-linking a phenolic resin
- Scott A. MacDonald
- C.B. Larson
- et al.
- 1993
- Microlithography 1993
Influence of polymer properties on airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- Microlithography 1993
Recent advances in chemically amplified resist materials
- C.G. Willson
- J.F. Cameron
- et al.
- 1992
- ACS PMSE 1992
Acid generation and acid diffusion in photoresist films
- D.R. McKean
- R.D. Allen
- et al.
- 1992
- Microlithography 1992