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Modeling polarization for Hyper-NA lithography tools and masks
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Magnetic and structural properties are presented for new ferromagnetic compounds of the form Rh2Mn X where X is Al, Ga, In, Tl, Sn, Pb, and Sb. The exchange is described in terms of competing ferromagnetic Mn-Rh-Mn interactions and antiferromagnetic Mn-Mn interactions. © 1976 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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