W.D. Hinsberg, F.A. Houle, et al.
Macromolecules
Mass spectrometric studies of the products of the reaction of XeF2 with silicon in the dark and under visible illumination have been carried out. The data show that photo-enchancement of the reaction is substantially different from thermal enchancement. It is proposed that photogenerated charge carries influence strongly both the overall etch rate and the reaction product distribution. © 1983.
W.D. Hinsberg, F.A. Houle, et al.
Macromolecules
U. Wetterauer, J. Knobloch, et al.
Journal of Applied Physics
F.A. Houle, Eric Guyer, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
G.M. Gallatin, F.A. Houle, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures