A. Hartstein, Z.A. Weinberg
Physical Review B
Raman scattering and optical transmission measurements have been made on chemically vapor-deposited Si-rich SiO2 films. The measurements show segregated regions of amorphous silicon in the as-deposited films. Annealing the films at 1150°C completely crystallizes the amorphous silicon. Annealing at lower temperatures produces films with both amorphous and crystalline regions.
A. Hartstein, Z.A. Weinberg
Physical Review B
J.C. Tsang, J.R. Kirtley, et al.
Physical Review Letters
G.S. Oehrlein, R.M. Tromp, et al.
JES
A. Hartstein, D.J. Dimaria, et al.
Journal of Applied Physics