Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We give a numerical criterion for a badly conditioned zero of a system of analytic equations to be part of a cluster of two zeros.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Yi Zhou, Parikshit Ram, et al.
ICLR 2023
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Satoshi Hada
IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences