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PaperAn XPS and Auger investigation of CF+3 ion bombardment of siliconT.J. Chuang, H.F. Winters, et al.Applications of Surface Science
PaperEffect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin filmsF. Fracassi, E. Occhiello, et al.Journal of Applied Physics
PaperPlasma-assisted etching: Ion-assisted surface chemistryJ.W. Coburn, Harold F. WintersApplications of Surface Science
