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Applied Spectroscopy Reviews
Paper
05 Dec 2006

Plasma Sources in Analytical Mass Spectrometry

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Abstract

No abstract available.

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A SIMS study of ion-assisted etching mechanisms; adsorbed fluorine on Si removed by ion bombardment

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Date

05 Dec 2006

Publication

Applied Spectroscopy Reviews

Authors

  • J.W. Coburn
  • W.W. Harrison
IBM-affiliated at time of publication

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